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Nb2Ox Sputtering Target-Planar/Rotatable

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Country: Singapore
City: Singapore

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note_add 23/09/2013
update 23/09/2013
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Offer Description - Nb2Ox Sputtering Target-Planar/Rotatable

We are a specialised original manufacturer of Sputtering targets since 2005 esp. Nb2Ox developed for DC sputtering process. Major properties:Low Resistivity,High Density and good thin film performance.High productivity and High Yield vs Nb reactive sputtering process.Proven for high power and high deposition sputtering process in PDP,Touch Screen Panel/Film,etc.We manufactured planar, disk up to 450mm Dia and rotatable targets.

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