ITO Target

Model Number: ITO



Purity: Based on Metal Impurity 99. 99% (Min. )

In2O3/ SnO2: 90/ 10

Purity: Based on Metal Impurity 99. 99% (Min. )

Oxygen: 17%

Color: Black

Resistance: 2. 1 u ohm. M2

Crystal size: 5um

Typical proportion: In2O3: SnO2 = 90: 10

In2O3: SnO2 = 95: 5

In2O3: SnO2 = 80: 20

Chemical Composition PPM (Max. )

Al <5; Bi <5; Ca<10; Cd < 5; Cu <5; Co <5; M o <5; Ni <5; Na <10; Si <5; Pb <5;

Zn <5; Cr <5; Fe <10; Mg <10; Mn <5; Sb <5;

Cl- <280

Physical Properties:

Relative Density (Min. ) 99%

Dimension (Max. ) : Different geometry is upon request

Production method: HP (Hot Press)

Application: ITO sputtering target is applied ford Flat Panel Display, Solar Cell Absorber and other transparent conductive films etc.

Bonding: Bonding target on Cu backing plates.