We are a specialised original manufacturer of Sputtering targets since 2005 esp. Nb2Ox developed for DC sputtering process. Major properties:Low Resistivity,High Density and good thin film performance.High productivity and High Yield vs Nb reactive sputtering process.Proven for high power and high deposition sputtering process in PDP,Touch Screen Panel/Film,etc.We manufactured planar, disk up to 450mm Dia and rotatable targets.
When having questions on Nb2Ox Sputtering Target-Planar/Rotatable, please send your inquury!
